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Atomic Layer Processing Coating Techniques Enable Missions to See Further into the Ultraviolet
- New approaches in thin film coatings using atomic layer deposition (ALD) and atomic layer etching (ALE) are enhancing ultraviolet (UV) light measurements in astrophysics.
- ALD and ALE techniques, common in the semiconductor industry, are now being used for optical coatings, particularly for ultraviolet wavelengths.
- Researchers at NASA JPL are developing fluoride-based ALD and ALE processes for ultraviolet instruments to improve reflectance and reduce absorption losses.
- Metal fluoride coatings protect aluminum mirrors used in UV instruments by preventing oxidation while maintaining high reflectance.
- SPRITE and Aspera astrophysics missions utilize ALD-deposited magnesium fluoride on lithium fluoride coatings to enhance UV performance and stability.
- ALD processes are crucial for creating multilayer aluminum and metal fluoride bandpass filters for UV imaging sensors, improving UV efficiency.
- The JPL team is focusing on applying ALD processes to larger-format sensors for the NASA UVEX mission, enhancing UV observations.
- Future work involves implementing bandpass filters on Si CMOS sensors for the NASA UVEX mission, targeting launch in the early 2030s.
- The synergy of ALD and PVD techniques in coating development is advancing ultraviolet observations in astrophysics missions.
- The use of ALD and ALE processes is revolutionizing optical coatings in UV instruments, offering precise control over layer thickness and material properties.
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