<ul><li>Researchers at KU Leuven and imec published a technical paper on automatic defect inspection algorithms for semiconductor manufacturing using scanning electron microscopy (SEM) images.</li><li>The paper discusses the importance of these algorithms due to the increasing defectivity in semiconductor manufacturing caused by shrinking device patterns.</li><li>The research aims to analyze and categorize various automatic defect inspection algorithms used in SEM image analysis for semiconductor manufacturing.</li><li>The open access paper titled 'Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review' was published in the Journal of Micro/Nanopatterning, Materials, and Metrology in May 2025.</li></ul>

Overview Of 103 Research Papers On Automatic SEM Image Analysis Algorithms For Semiconductor Defect Inspection (KU Leuven, Imec)

Discover more