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Quantum Transport in Nanosheet Gate-All-Around Transistors

  • A research team led by Kim, Park, and Jin investigates quantum transport in nanosheet gate-all-around transistors, revealing insights critical for semiconductor device advancement.
  • The study, published in Communications Engineering, focuses on electron behavior in nanosheet GAA transistors, addressing scaling limitations and quantum effects.
  • Sophisticated modeling and experimental validation were used to explore electron flow in nanoscale constrictions, showing resonant tunneling effects.
  • Resonances in electron transmission probabilities were observed, offering precise current flow modulation by adjusting constriction dimensions.
  • The research highlights the role of electron-phonon interactions impacting quantum coherence and device performance, crucial for optimizing transistor efficiency.
  • Material quality and precise atomic-level control are emphasized for defining quantum transport characteristics in nanosheet transistors.
  • The study reveals band structure alterations in constricted nanosheets, providing insights on charge carrier mobility and switching speeds for transistor efficiency.
  • Modulating quantum transport in nanosheet constrictions opens avenues for quantum information processing and novel computing paradigms.
  • The implications extend to low-power electronics, leveraging quantum effects to reduce power consumption and improve computational efficiency.
  • This interdisciplinary research bridges physics, engineering, and nanotechnology, guiding future innovations in semiconductor device design.

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